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响应面法优化UV/H2O2光氧化法处理高浓度LAS废水

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曹先仲, 魏未, 朱丽娟. 响应面法优化UV/H2O2光氧化法处理高浓度LAS废水[J]. 环境工程学报, 2014, 8(4): 1543-1548.
引用本文: 曹先仲, 魏未, 朱丽娟. 响应面法优化UV/H2O2光氧化法处理高浓度LAS废水[J]. 环境工程学报, 2014, 8(4): 1543-1548.
shu
Cao Xianzhong, Wei Wei, Zhu Lijuan. Optimization of UV/H2O2 photo oxidation process to treat high concentration LAS wastewater by response surface methodology[J]. Chinese Journal of Environmental Engineering, 2014, 8(4): 1543-1548.
Citation: Cao Xianzhong, Wei Wei, Zhu Lijuan. Optimization of UV/H2O2 photo oxidation process to treat high concentration LAS wastewater by response surface methodology[J]. Chinese Journal of Environmental Engineering, 2014, 8(4): 1543-1548.
shu

响应面法优化UV/H2O2光氧化法处理高浓度LAS废水

  • 1.

    河南省冶金研究所有限责任公司, 郑州 450053

  • 2.

    河南省科学院质量检验与分析测试研究中心, 郑州 450008

  • 基金项目:

  • 中图分类号: X703.1

Optimization of UV/H2O2 photo oxidation process to treat high concentration LAS wastewater by response surface methodology

  • 1.

    Henan Institute of Metallurgy Co.Ltd., Zhengzhou, 450053, China

  • 2.

    Research Center of Quality Inspection and Analysis-Testing, Henan Academy of Sciences, Zhengzhou 450002, China

  • Fund Project:

  • 摘要: 采用响应面法对UV/H2O2光氧化法处理高浓度LAS废水的工艺参数进行了系统研究。根据Box-Behnken Design（BBD）设计原理，以初始pH与H2O2投加量、反应时间和温度为主要影响因素，设计4因素3水平共29个实验点的实验方案，并建立了二次响应面拟合模型。方差分析表明，初始pH与H2O2投加量、反应时间和温度以及初始pH和H2O2投加量、H2O2投加量和温度之间的交互作用，对实验结果具有显著性影响。实验得到的光氧化高浓度LAS废水最佳工艺条件，pH为4.0，H2O2投加量为40 mmol/L，反应时间为90 min，温度为25℃，在此条件下，LAS的平均去除率为98.1%。
    Abstract: Response surface methodology (RSM) was utilized to facilitate a more systematic understanding of the processing parameters of UV/H2O2 photo oxidation process to treat the high concentration LAS wastewater.The four factors in this study using the Box-Behnken Design (BBD) design principles included initial pH,H2O2 dosage,reaction time and temperature,and a total of 29 experimental points of the four-factor,three-level experimental program was designed.A response surface quadratic model in terms of actual factors was obtained based on the experimental data.Analysis of variance (ANOVA) showed that initial pH,H2O2 dosage,reaction time and temperature,the interactive effect between the initial pH and H2O2 dosage as well as H2O2 dosage and temperature were demonstrated statistically significant in the LAS removal efficiency.The optimum conditions of photo-oxidation were determined to be initial pH 4.0,H2O2 of 40 mmol/L,reaction time of 90 min and reaction temperature of 25℃.The removal efficiency of LAS was up to 98.1% under the optimal conditions.
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  • [1] 蒋永生, 高宇.超声波降解废水中十二烷基苯磺酸钠的实验研究.重庆工商大学学报(自然科学版), 2004, 21 (1):32-34 Jiang Y.S., Gao Y.Decomposition of sodium dodecylneopelex in wastewater by using ultrasonic wave.Journal of CTBU (Nat.Scien.Edit.), 2004, 21 (1):32-34(in Chinese)
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    [7] 高建峰, 徐春彦, 白婷婷.用CuO/AC催化氧化降解水中 LAS的研究.工业水处理, 2008, 28 (6):47-50 Gao J F., Xu C Y., Bai T.T.Research on the catalytic oxidation degradation of aqueous LAS by using CuO/AC.Industrial Water Treatment, 2008, 28 (6):47-50(in Chinese)
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  • 收稿日期:  2013-04-18
  • 刊出日期:  2014-03-28
曹先仲, 魏未, 朱丽娟. 响应面法优化UV/H2O2光氧化法处理高浓度LAS废水[J]. 环境工程学报, 2014, 8(4): 1543-1548.
引用本文: 曹先仲, 魏未, 朱丽娟. 响应面法优化UV/H2O2光氧化法处理高浓度LAS废水[J]. 环境工程学报, 2014, 8(4): 1543-1548.
shu
Cao Xianzhong, Wei Wei, Zhu Lijuan. Optimization of UV/H2O2 photo oxidation process to treat high concentration LAS wastewater by response surface methodology[J]. Chinese Journal of Environmental Engineering, 2014, 8(4): 1543-1548.
Citation: Cao Xianzhong, Wei Wei, Zhu Lijuan. Optimization of UV/H2O2 photo oxidation process to treat high concentration LAS wastewater by response surface methodology[J]. Chinese Journal of Environmental Engineering, 2014, 8(4): 1543-1548.
shu

响应面法优化UV/H2O2光氧化法处理高浓度LAS废水

  • 1.  河南省冶金研究所有限责任公司, 郑州 450053
  • 2.  河南省科学院质量检验与分析测试研究中心, 郑州 450008
  • 收稿日期:  2013-04-18
基金项目:

摘要: 采用响应面法对UV/H2O2光氧化法处理高浓度LAS废水的工艺参数进行了系统研究。根据Box-Behnken Design（BBD）设计原理，以初始pH与H2O2投加量、反应时间和温度为主要影响因素，设计4因素3水平共29个实验点的实验方案，并建立了二次响应面拟合模型。方差分析表明，初始pH与H2O2投加量、反应时间和温度以及初始pH和H2O2投加量、H2O2投加量和温度之间的交互作用，对实验结果具有显著性影响。实验得到的光氧化高浓度LAS废水最佳工艺条件，pH为4.0，H2O2投加量为40 mmol/L，反应时间为90 min，温度为25℃，在此条件下，LAS的平均去除率为98.1%。

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